U. Zastrau,
V. Hilbert,
C. Brown,
T. Döppner,
S. Dziarzhytski,
E. Förster,
S. H. Glenzer,
S. Göde,
G. Gregori,
M. Harmand,
D. Hochhaus,
T. Laarmann,
H. J. Lee,
K. -H. Meiwes-Brör,
P. Neumayer,
A. Przystawik,
P. Radcliffe,
M. Schulz,
S. Skruszewicz,
F. Tavella,
J. Tiggesbaeumker,
S. Toleikis,
and T. White
In-situ determination of dispersion and resolving power in simultaneous multiple-angle XUV spectroscopy
J. Instrum., 6 :P10001 (October 2011)
In-situ determination of dispersion and resolving power in simultaneous multiple-angle XUV spectroscopy
J. Instrum., 6 :P10001 (October 2011)
Abstract:
We report on the simultaneous determination of non-linear dispersion functions and resolving power of three flat-field XUV grating spectrometers. A moderate-intense short-pulse infrared laser is focused onto technical aluminum which is commonly present as part of the experimental setup. In the XUV wavelength range of 10-19 nm, the spectrometers are calibrated using Al-Mg plasma emission lines. This cross-calibration is performed in-situ in the very same setup as the actual main experiment. The results are in excellent agreement with ray-tracing simulations. We show that our method allows for precise relative and absolute calibration of three different XUV spectrometers.